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Efficient Coating Process for Clear Wafer Edge in Semiconductor Manufacturing

Himani Katariya; Parth Kalyana; Hiranya Soni; Ishita Sharma; Vijendra Maurya; Anupma Mehra

Published
Publisher
IEEE
Journal / collection
2025 International Conference on Artificial Intelligence and Machine Vision (AIMV)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/aimv66517.2025.11203532

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Himani Katariya; Parth Kalyana; Hiranya Soni; Ishita Sharma; Vijendra Maurya; Anupma Mehra. Efficient Coating Process for Clear Wafer Edge in Semiconductor Manufacturing. 2025 International Conference on Artificial Intelligence and Machine Vision (AIMV). 2025-08. https://doi.org/10.1109/aimv66517.2025.11203532

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