In-line XPS for advanced semiconductor manufacturing and metrology on fully integrated targets
Christopher J. Lee; Manasa Medikonda; Trevor McDonough; Will Parkin; Ruqiang Bao; Paul Isbester; Mark Klare; Daniel Schmidt
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XL
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3091932
The original publisher provides the full text and its access options.
Cite this source
Christopher J. Lee; Manasa Medikonda; Trevor McDonough; Will Parkin; Ruqiang Bao; Paul Isbester; Mark Klare; Daniel Schmidt. In-line XPS for advanced semiconductor manufacturing and metrology on fully integrated targets. Metrology, Inspection, and Process Control XL. 2026-04-08. https://doi.org/10.1117/12.3091932