Performance improvements in All-2D Te field effect transistor with layer-engineered homojunction using sputtering deposition
Min Jeong Kim; Ojun Kwon; Seyoung Oh; Eunjeong Cho; Wondeok Seo; Yeongeun Kwon; Shinhoi Kim; Minhee Kim; Kyungmin Lee; Minyoung Choi; Ah Ra Kim; Jongwon Yoon; Woojin Park; Byungjin Cho
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Science in Semiconductor Processing
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mssp.2026.110443
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Cite this source
Min Jeong Kim; Ojun Kwon; Seyoung Oh; Eunjeong Cho; Wondeok Seo; Yeongeun Kwon; Shinhoi Kim; Minhee Kim; Kyungmin Lee; Minyoung Choi; Ah Ra Kim; Jongwon Yoon; Woojin Park; Byungjin Cho. Performance improvements in All-2D Te field effect transistor with layer-engineered homojunction using sputtering deposition. Materials Science in Semiconductor Processing. 2026-05. https://doi.org/10.1016/j.mssp.2026.110443