RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films
Rui Gao; Mengna Dai; Xin Zou; Yuheng Wang
- Published
- Publisher
- MDPI AG
- Journal / collection
- Micromachines
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.3390/mi17101139
The original publisher provides the full text and its access options.
Cite this source
Rui Gao; Mengna Dai; Xin Zou; Yuheng Wang. RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films. Micromachines. 2026-09-30. https://doi.org/10.3390/mi17101139