Comparison of Kinetic and Fluid Simulation Models for RF Capacitively Coupled Plasmas in Semiconductor Processing
Hwanho Kim; Min Uk Lee; Hae June Lee
- Published
- Publisher
- MDPI AG
- Journal / collection
- Materials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.3390/ma19091900
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Cite this source
Hwanho Kim; Min Uk Lee; Hae June Lee. Comparison of Kinetic and Fluid Simulation Models for RF Capacitively Coupled Plasmas in Semiconductor Processing. Materials. 2026-05-05. https://doi.org/10.3390/ma19091900