A Perspective on Interconnect Scaling Challenges in the NanoStack Transistor Era : AP/DFM: Advanced Patterning / Design for Manufacturing (Design-Technology Co-Optimization)
Nicholas A. Lanzillo; Shahrukh Khan; Jim Mazza; Utkarsh Bajpai; Koichi Motoyama
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 36th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/asmc64512.2025.11010679
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Cite this source
Nicholas A. Lanzillo; Shahrukh Khan; Jim Mazza; Utkarsh Bajpai; Koichi Motoyama. A Perspective on Interconnect Scaling Challenges in the NanoStack Transistor Era : AP/DFM: Advanced Patterning / Design for Manufacturing (Design-Technology Co-Optimization). 2025 36th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). 2025-05-05. https://doi.org/10.1109/asmc64512.2025.11010679