Open collaborative AI platform to support process optimization for semiconductor industry with digital twin
Julien Baderot; Marion Grould; Ali Hallal; Johann Foucher
- Published
- Publisher
- SPIE
- Journal / collection
- DTCO and Computational Patterning V
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3090718
The original publisher provides the full text and its access options.
Cite this source
Julien Baderot; Marion Grould; Ali Hallal; Johann Foucher. Open collaborative AI platform to support process optimization for semiconductor industry with digital twin. DTCO and Computational Patterning V. 2026-04-10. https://doi.org/10.1117/12.3090718