Impact of exposure settings variations on contrast and spatial resolution in complementary metal oxide semiconductor and direct-conversion complementary metal oxide semiconductor intraoral sensors
Daniela Pita de Melo; Luiz Eduardo Marinho-Vieira; Caroline Hoang; Crystal Ly; Ryan Kuhn; Jacqueline Tkachuk; Saulo L Sousa Melo
- Published
- Publisher
- Oxford University Press (OUP)
- Journal / collection
- Dentomaxillofacial Radiology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1093/dmfr/twag056
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Cite this source
Daniela Pita de Melo; Luiz Eduardo Marinho-Vieira; Caroline Hoang; Crystal Ly; Ryan Kuhn; Jacqueline Tkachuk; Saulo L Sousa Melo. Impact of exposure settings variations on contrast and spatial resolution in complementary metal oxide semiconductor and direct-conversion complementary metal oxide semiconductor intraoral sensors. Dentomaxillofacial Radiology. 2026-07-31. https://doi.org/10.1093/dmfr/twag056