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Research literature / Conference paper

Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing III

Hakaru Mizoguchi

Published: 23 April 2025
Publisher: SPIE
Journal / collection: Optical and EUV Nanolithography XXXVIII
Research area: Semiconductors
Source type: Conference paper
DOI: 10.1117/12.3049877

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Hakaru Mizoguchi. Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing III. Optical and EUV Nanolithography XXXVIII. 2025-04-23. https://doi.org/10.1117/12.3049877