AFM metrology for 3D high aspect ratio semiconductor structures
Hokyun Chin; ShihWei Yu; Lucas Rencker; Omid Tajalizadehkhoob; Khalid El Maghawry Elsayed; Po-Cheng Wu; Duygu Akbulut; Niranjan Saikumar; Hamed Sadeghian
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XXXIX
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3054048
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Cite this source
Hokyun Chin; ShihWei Yu; Lucas Rencker; Omid Tajalizadehkhoob; Khalid El Maghawry Elsayed; Po-Cheng Wu; Duygu Akbulut; Niranjan Saikumar; Hamed Sadeghian. AFM metrology for 3D high aspect ratio semiconductor structures. Metrology, Inspection, and Process Control XXXIX. 2025-04-24. https://doi.org/10.1117/12.3054048