High mobility In 2 O 3 thin films grown by atomic layer deposition using a microwave remote plasma source for field-effect transistor applications
Yuto Kawato; Takanori Takahashi; Toshihiro Tamai; Shunichi Mikami; Yukiharu Uraoka
- Published
- Publisher
- IOP Publishing
- Journal / collection
- Applied Physics Express
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.35848/1882-0786/ae1b62
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Cite this source
Yuto Kawato; Takanori Takahashi; Toshihiro Tamai; Shunichi Mikami; Yukiharu Uraoka. High mobility In 2 O 3 thin films grown by atomic layer deposition using a microwave remote plasma source for field-effect transistor applications. Applied Physics Express. 2025-11-01. https://doi.org/10.35848/1882-0786/ae1b62