Process temperature dependence of sputtered MgO/ n -type GaN metal–oxide–semiconductor capacitors
Liron Shvilberg; Haotian Xue; Elia J. Palmese; Helge H. Heinrich; Joanne Kuan; Gabrielle C. Abad; Nikhil Shukla; Stephen J. McDonnell; Jonathan J. Wierer; Jon F. Ihlefeld
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Journal of Applied Physics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0276229
The original publisher provides the full text and its access options.
Cite this source
Liron Shvilberg; Haotian Xue; Elia J. Palmese; Helge H. Heinrich; Joanne Kuan; Gabrielle C. Abad; Nikhil Shukla; Stephen J. McDonnell; Jonathan J. Wierer; Jon F. Ihlefeld. Process temperature dependence of sputtered MgO/ n -type GaN metal–oxide–semiconductor capacitors. Journal of Applied Physics. 2025-07-22. https://doi.org/10.1063/5.0276229