Enhanced critical dimension metrology of semiconductor packaging via dual-band scatterometry and sequential optimization
Fu-Sheng Yang; Tan-Phuc Le; Surajit Das; Min-Ru Wu; Liang-Chia Chen
- Published
- Publisher
- IOP Publishing
- Journal / collection
- Measurement Science and Technology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1088/1361-6501/ae7745
The original publisher provides the full text and its access options.
Cite this source
Fu-Sheng Yang; Tan-Phuc Le; Surajit Das; Min-Ru Wu; Liang-Chia Chen. Enhanced critical dimension metrology of semiconductor packaging via dual-band scatterometry and sequential optimization. Measurement Science and Technology. 2026-06-12. https://doi.org/10.1088/1361-6501/ae7745