Quantitative model of sidewall redeposition and cleaning in ion beam etching for semiconductor device fabrication
Jie Li
- Published
- Publisher
- American Vacuum Society
- Journal / collection
- Journal of Vacuum Science & Technology A
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1116/6.0005514
The original publisher provides the full text and its access options.
Cite this source
Jie Li. Quantitative model of sidewall redeposition and cleaning in ion beam etching for semiconductor device fabrication. Journal of Vacuum Science & Technology A. 2026-09-29. https://doi.org/10.1116/6.0005514