Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges
Chi-Hoon Lee; Seong-Hwan Ryu; Taewon Hwang; Sang-Hyun Kim; Yoon-Seo Kim; Jin-Seong Park
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Nano-Micro Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s40820-025-02013-7
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Cite this source
Chi-Hoon Lee; Seong-Hwan Ryu; Taewon Hwang; Sang-Hyun Kim; Yoon-Seo Kim; Jin-Seong Park. Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges. Nano-Micro Letters. 2026-01-05. https://doi.org/10.1007/s40820-025-02013-7