Scaling $V_{DD}$ for P-Type 2D-Material Channel Transistor: what Non-Idealities are Still to be Solved
Chao-Ching Cheng; Ang-Sheng Chou; Edward Chen; Ming-Yang Li; Yu-Wei Hsu; Chia-Chin Cheng; Seong Rae Cho; Haomin Liu; Po-Sen Mao; Wen-Chia Wu; Shuer Ku; Wei-Sheng Yun; Chih-Piao Chuu; Wei-Yen Woon; Lain-Jong Li; Vincent Tung; Chih-I Wu; Iuliana Radu; Min Cao
- Published
- Publisher
- IEEE
- Journal / collection
- 2026 IEEE/JSAP Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/vlsitechnologyandcir65830.2026.11577424
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Cite this source
Chao-Ching Cheng; Ang-Sheng Chou; Edward Chen; Ming-Yang Li; Yu-Wei Hsu; Chia-Chin Cheng; Seong Rae Cho; Haomin Liu; Po-Sen Mao; Wen-Chia Wu; Shuer Ku; Wei-Sheng Yun; Chih-Piao Chuu; Wei-Yen Woon; Lain-Jong Li; Vincent Tung; Chih-I Wu; Iuliana Radu; Min Cao. Scaling $V_{DD}$ for P-Type 2D-Material Channel Transistor: what Non-Idealities are Still to be Solved. 2026 IEEE/JSAP Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits). 2026-06-14. https://doi.org/10.1109/vlsitechnologyandcir65830.2026.11577424