Magnetic Filter-Enhanced Plasma Etching: Scaling Laws and Yield Optimisation for Semiconductor Structures
Paul D. Markov
- Published
- Publisher
- Academic Edge Press
- Journal / collection
- Journal of Mechanics and Materials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.64820/aepjmm.11.29.35.122025
The original publisher provides the full text and its access options.
Cite this source
Paul D. Markov. Magnetic Filter-Enhanced Plasma Etching: Scaling Laws and Yield Optimisation for Semiconductor Structures. Journal of Mechanics and Materials. 2025-12-31. https://doi.org/10.64820/aepjmm.11.29.35.122025