Scalable Inter‐Dielectric Engineering via Vapor‐Phase Synthesis Process for Top‐Gate MoS 2 Thin‐Film Transistor
Seohak Park; Mingu Kang; Inseong Lee; Seungsun Yoo; Sejin Kim; Hyeongjin Lim; Woonggi Hong; Min Ju Kim; Cheolmin Park; Jeoungmin Ji; Seunghyup Yoo; Sung‐Yool Choi
- Published
- Publisher
- Wiley
- Journal / collection
- Small
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/smll.202506282
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Cite this source
Seohak Park; Mingu Kang; Inseong Lee; Seungsun Yoo; Sejin Kim; Hyeongjin Lim; Woonggi Hong; Min Ju Kim; Cheolmin Park; Jeoungmin Ji; Seunghyup Yoo; Sung‐Yool Choi. Scalable Inter‐Dielectric Engineering via Vapor‐Phase Synthesis Process for Top‐Gate MoS 2 Thin‐Film Transistor. Small. 2025-08-26. https://doi.org/10.1002/smll.202506282