High-NA EUV for high volume manufacturing
Chris De Ruiter; Herman Heijmerikx; Stef Hendriks; Jara Garcia Santaclara; Christian Wagner; Gunes Nakiboglu; Tim Goossens; Joerg Mallmann; Roel Boumen; Greet Storms
- Published
- Publisher
- SPIE
- Journal / collection
- Optical and EUV Nanolithography XXXIX
- Research area
- Industrial systems
- Source type
- Conference paper
- DOI
- 10.1117/12.3091036
The original publisher provides the full text and its access options.
Cite this source
Chris De Ruiter; Herman Heijmerikx; Stef Hendriks; Jara Garcia Santaclara; Christian Wagner; Gunes Nakiboglu; Tim Goossens; Joerg Mallmann; Roel Boumen; Greet Storms. High-NA EUV for high volume manufacturing. Optical and EUV Nanolithography XXXIX. 2026-04-10. https://doi.org/10.1117/12.3091036