Synalib: A fast OCD engine with parametric process flow modeling for high-throughput semiconductor metrology
Yanzhong Ma; Xiangyu Ma; Xiaoqing Gao; Langfeng Wen; Boqu He; Chao Chen
- Published
- Publisher
- SPIE
- Journal / collection
- Ninth International Workshop on Advanced Patterning Solutions (IWAPS 2025)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3093303
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Cite this source
Yanzhong Ma; Xiangyu Ma; Xiaoqing Gao; Langfeng Wen; Boqu He; Chao Chen. Synalib: A fast OCD engine with parametric process flow modeling for high-throughput semiconductor metrology. Ninth International Workshop on Advanced Patterning Solutions (IWAPS 2025). 2025-12-03. https://doi.org/10.1117/12.3093303