Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication
Ben Ikenson
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Scilight
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/10.0046481
The original publisher provides the full text and its access options.
Cite this source
Ben Ikenson. Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication. Scilight. 2026-08-25. https://doi.org/10.1063/10.0046481