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Research literature / Conference paper

Correlative In-Situ AFM-in-SEM Technique for Advanced Semiconductor Failure Analysis and Material Characterization

Jan Neuman; Radek Dao; Ondøej Novotný; Veronika Hegrová; Rosalinda Ring; Libor Strakoš; Lukáš Kormoš; Claudiu Colbea; Adam Stokes; Umberto Celano; Ashiqur Rahman Laskar

Published
Publisher
ASM International
Journal / collection
International Symposium for Testing and Failure Analysis
Research area
Semiconductors
Source type
Conference paper
DOI
10.31399/asm.cp.istfa2025tp00i1

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Jan Neuman; Radek Dao; Ondøej Novotný; Veronika Hegrová; Rosalinda Ring; Libor Strakoš; Lukáš Kormoš; Claudiu Colbea; Adam Stokes; Umberto Celano; Ashiqur Rahman Laskar. Correlative In-Situ AFM-in-SEM Technique for Advanced Semiconductor Failure Analysis and Material Characterization. International Symposium for Testing and Failure Analysis. 2025-11-16. https://doi.org/10.31399/asm.cp.istfa2025tp00i1

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