Low Temperature Plasmas for Etching of Semiconductor Devices
A. Paterson; T. Lill; H. Singh
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 IEEE Pulsed Power & Plasma Science (PPPS)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/ppps56198.2025.11248625
The original publisher provides the full text and its access options.
Cite this source
A. Paterson; T. Lill; H. Singh. Low Temperature Plasmas for Etching of Semiconductor Devices. 2025 IEEE Pulsed Power & Plasma Science (PPPS). 2025-06-15. https://doi.org/10.1109/ppps56198.2025.11248625