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Artificial Neural Network-driven Diffraction Imaging for Nanoscale Optical Critical Dimension Metrology in Semiconductor Manufacturing

Fu-Sheng Yang; Liang-Chia Chen; Chao-Ching Ho

Published
Publisher
Springer Science and Business Media LLC
Research area
AI & compute
Source type
Preprint / posted paper
DOI
10.21203/rs.3.rs-7467039/v1

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Fu-Sheng Yang; Liang-Chia Chen; Chao-Ching Ho. Artificial Neural Network-driven Diffraction Imaging for Nanoscale Optical Critical Dimension Metrology in Semiconductor Manufacturing. Springer Science and Business Media LLC. 2025-09-04. https://doi.org/10.21203/rs.3.rs-7467039/v1

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