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Research literature / Conference paper

In-Ga-Zn-O Vertical Transistor Technology for the New Type of 4F 2 DRAM Application

Ken-Ichi Haga; Shoichi Kabuyanagi; Keiko Ariyoshi; Keiji Ikeda; Kei Sakamoto; Shosuke Fujii; Takeshi Fujimaki; Tseng Fu Lu; Szu Yao Chang; Chiang-Lin Shih

Published
Publisher
IEEE
Journal / collection
2025 32nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
Research area
Semiconductors
Source type
Conference paper
DOI
10.23919/am-fpd66451.2025.11110293

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Ken-Ichi Haga; Shoichi Kabuyanagi; Keiko Ariyoshi; Keiji Ikeda; Kei Sakamoto; Shosuke Fujii; Takeshi Fujimaki; Tseng Fu Lu; Szu Yao Chang; Chiang-Lin Shih. In-Ga-Zn-O Vertical Transistor Technology for the New Type of 4F 2 DRAM Application. 2025 32nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD). 2025-07-01. https://doi.org/10.23919/am-fpd66451.2025.11110293

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