Key Roles and Performance Optimization of Photoresist Materials in Semiconductor Manufacturing
Guolai Xu; Weifu Shu; Fang Yang
- Published
- Publisher
- Academic Frontiers Publishing Group
- Journal / collection
- Journal of Technology Innovation and Engineering
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.63887/jtie.2025.1.8.4
The original publisher provides the full text and its access options.
Cite this source
Guolai Xu; Weifu Shu; Fang Yang. Key Roles and Performance Optimization of Photoresist Materials in Semiconductor Manufacturing. Journal of Technology Innovation and Engineering. 2025-12-31. https://doi.org/10.63887/jtie.2025.1.8.4