Performance Analysis of Symmetrical Single and Dual Spacer Engineering On a Novel Dopingless Nanosheet Field-effect Transistor (DL-NSFET)
Abhishek Chauhan; Ashish Raman
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Silicon
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s12633-025-03489-z
The original publisher provides the full text and its access options.
Cite this source
Abhishek Chauhan; Ashish Raman. Performance Analysis of Symmetrical Single and Dual Spacer Engineering On a Novel Dopingless Nanosheet Field-effect Transistor (DL-NSFET). Silicon. 2025-11-25. https://doi.org/10.1007/s12633-025-03489-z