Low-temperature nano-heteroepitaxy of the entire III-nitride semiconductor family using plasma-ALD
Steven Allaby; Fatih Bayansal; Brian G. Willis; Necmi Biyikli
- Published
- Publisher
- SPIE
- Journal / collection
- Low-Dimensional Materials and Devices 2025
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3068333
The original publisher provides the full text and its access options.
Cite this source
Steven Allaby; Fatih Bayansal; Brian G. Willis; Necmi Biyikli. Low-temperature nano-heteroepitaxy of the entire III-nitride semiconductor family using plasma-ALD. Low-Dimensional Materials and Devices 2025. 2025-09-17. https://doi.org/10.1117/12.3068333