Lithography strategies on overlay control of backside processing in complementary field effect transistor (CFET) device
Rajendra K. Saroj; Andrea Mingardi; Sujan K. Sarkar; Teresa Rodrigues; Koen D'havé; Anne Vandooren; Cassie Sheng; Karen Stiers; Camila T. Cavalcante; Steven Demuynck; Naoto Horiguchi; Serge Biesemans; Lucas P. Barbosa; Mircea Dusa; Sandip Halder
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Extreme Ultraviolet Lithography 2025
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3071940
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Cite this source
Rajendra K. Saroj; Andrea Mingardi; Sujan K. Sarkar; Teresa Rodrigues; Koen D'havé; Anne Vandooren; Cassie Sheng; Karen Stiers; Camila T. Cavalcante; Steven Demuynck; Naoto Horiguchi; Serge Biesemans; Lucas P. Barbosa; Mircea Dusa; Sandip Halder. Lithography strategies on overlay control of backside processing in complementary field effect transistor (CFET) device. International Conference on Extreme Ultraviolet Lithography 2025. 2025-11-06. https://doi.org/10.1117/12.3071940