Development of spin-coating UV-NIL resist for semiconductor device manufacturing
Akihiro Hakamata; Keita Kato; Kazuyuki Usuki
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2026
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3087846
The original publisher provides the full text and its access options.
Cite this source
Akihiro Hakamata; Keita Kato; Kazuyuki Usuki. Development of spin-coating UV-NIL resist for semiconductor device manufacturing. Novel Patterning Technologies 2026. 2026-04-08. https://doi.org/10.1117/12.3087846