Thermodynamics-Enhanced Post-Exposure Bake for High-Fidelity Semiconductor Patterning
Hyung Ju Ryu; Tae-Ho Kim; Ju-Mi Bang; Man-Kyu Kang; Seunghwa Oh; Woojin Jung; Sang-Hee Lee; Joonsoo Park; Edward J. Park
- Published
- Publisher
- Elsevier BV
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.2139/ssrn.7493838
This is a preprint or other posted paper. Check the original source for its review and publication status.
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Cite this source
Hyung Ju Ryu; Tae-Ho Kim; Ju-Mi Bang; Man-Kyu Kang; Seunghwa Oh; Woojin Jung; Sang-Hee Lee; Joonsoo Park; Edward J. Park. Thermodynamics-Enhanced Post-Exposure Bake for High-Fidelity Semiconductor Patterning. Elsevier BV. 2026. https://doi.org/10.2139/ssrn.7493838