Enhanced anisotropy in advanced semiconductor nanofabrication via ultralow electron temperature plasma for cryogenic etching
Min-Seok Kim; Jong Ha Ahn; Deok Hwan Kim; Seok Hyeon Ha; Chin-Wook Chung
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Science in Semiconductor Processing
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mssp.2025.110156
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Cite this source
Min-Seok Kim; Jong Ha Ahn; Deok Hwan Kim; Seok Hyeon Ha; Chin-Wook Chung. Enhanced anisotropy in advanced semiconductor nanofabrication via ultralow electron temperature plasma for cryogenic etching. Materials Science in Semiconductor Processing. 2026-02. https://doi.org/10.1016/j.mssp.2025.110156