When correlation becomes causation: deep learning for complex anomaly detection in semiconductor yield
Jungwook Shon; Simon S. Woo
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Extreme Ultraviolet Lithography 2025
- Research area
- AI & compute
- Source type
- Conference paper
- DOI
- 10.1117/12.3071325
The original publisher provides the full text and its access options.
Cite this source
Jungwook Shon; Simon S. Woo. When correlation becomes causation: deep learning for complex anomaly detection in semiconductor yield. International Conference on Extreme Ultraviolet Lithography 2025. 2025-11-06. https://doi.org/10.1117/12.3071325