Skip to content
Independent research & intelligence
OPEN VARIABLE

Evidence-First Signal Intelligence

Menu

Research literature / Conference paper

An Ensemble Virtual Metrology Model of Machine Learning in Semiconductor Manufacturing

Yawei Chen; Shaohua Chang; Eric Chien

Published
Publisher
IEEE
Journal / collection
2025 IEEE 18th International Symposium on Embedded Multicore/Many-core Systems-on-Chip (MCSoC)
Research area
AI & compute
Source type
Conference paper
DOI
10.1109/mcsoc67473.2025.00118

Read the original source ↗

The original publisher provides the full text and its access options.

Cite this source

Yawei Chen; Shaohua Chang; Eric Chien. An Ensemble Virtual Metrology Model of Machine Learning in Semiconductor Manufacturing. 2025 IEEE 18th International Symposium on Embedded Multicore/Many-core Systems-on-Chip (MCSoC). 2025-12-15. https://doi.org/10.1109/mcsoc67473.2025.00118

Download RIS