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Study on the Interfacial Behavior of W CMP on SiGe Film for Disruptive Semiconductor Devices

Jeehwan Heo; Juyeon Han; Sangwon Byun; Seokjun Hong; Jinwoo Bae; Jong Hyuk PARK; Bo UN Yoon

Published
Publisher
The Electrochemical Society
Journal / collection
ECS Meeting Abstracts
Research area
Semiconductors
Source type
Journal article
DOI
10.1149/ma2026-01211200mtgabs

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Jeehwan Heo; Juyeon Han; Sangwon Byun; Seokjun Hong; Jinwoo Bae; Jong Hyuk PARK; Bo UN Yoon. Study on the Interfacial Behavior of W CMP on SiGe Film for Disruptive Semiconductor Devices. ECS Meeting Abstracts. 2026-07-07. https://doi.org/10.1149/ma2026-01211200mtgabs

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