Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers
Chang Niu; Linjia Long; Luqi Zheng; Shuting Du; Jian-Yu Lin; Kisoo Nam; Zehao Lin; Chang Liu; Juanjuan Lu; Haiyan Wang; Haitong Li; Peide D. Ye
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Nature Nanotechnology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1038/s41565-026-02276-0
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Cite this source
Chang Niu; Linjia Long; Luqi Zheng; Shuting Du; Jian-Yu Lin; Kisoo Nam; Zehao Lin; Chang Liu; Juanjuan Lu; Haiyan Wang; Haitong Li; Peide D. Ye. Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers. Nature Nanotechnology. 2026-09-15. https://doi.org/10.1038/s41565-026-02276-0