Effect of Chromium Adhesion Layer Thickness on Contact Resistance and Schottky Barrier Characteristics in WSe2 Field-Effect Transistor
Sung-Ha Kim; Seong-Yeon Lee; Tae-Jeong Kim; Kwangseuk Kyhm; Kenji Watanabe; Takashi Taniguchi; Ki-Ju Yee
- Published
- Publisher
- MDPI AG
- Journal / collection
- Nanomaterials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.3390/nano15181413
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Cite this source
Sung-Ha Kim; Seong-Yeon Lee; Tae-Jeong Kim; Kwangseuk Kyhm; Kenji Watanabe; Takashi Taniguchi; Ki-Ju Yee. Effect of Chromium Adhesion Layer Thickness on Contact Resistance and Schottky Barrier Characteristics in WSe2 Field-Effect Transistor. Nanomaterials. 2025-09-13. https://doi.org/10.3390/nano15181413