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Research literature / Conference paper

A Spatiotemporal Attention Enhanced ConvLSTM Model for thin film deposition prediction in semiconductor manufacturing

Kun Pang; Li Ding; Junjie Li; Zhiqiang Li; Hua Shao; Rui Chen; Zhenjie Yao

Published
Publisher
IEEE
Journal / collection
2025 International Symposium of Electronics Design Automation (ISEDA)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/iseda65950.2025.11100442

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Kun Pang; Li Ding; Junjie Li; Zhiqiang Li; Hua Shao; Rui Chen; Zhenjie Yao. A Spatiotemporal Attention Enhanced ConvLSTM Model for thin film deposition prediction in semiconductor manufacturing. 2025 International Symposium of Electronics Design Automation (ISEDA). 2025-05-09. https://doi.org/10.1109/iseda65950.2025.11100442

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