Top-Gate Oxide Semiconductor Transistor with High Mobility and Steep Subthreshold Slope Enabled by Oxygen-Rich Gate Insulator Process
Kai Jiang; Ziheng Wang; Zhiyu Lin; Mengwei Si
- Published
- Publisher
- The Japan Society of Applied Physics
- Journal / collection
- Extended Abstracts of the 2025 International Conference on Solid State Devices and Materials
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.7567/ssdm.2025.n-2-01
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Cite this source
Kai Jiang; Ziheng Wang; Zhiyu Lin; Mengwei Si. Top-Gate Oxide Semiconductor Transistor with High Mobility and Steep Subthreshold Slope Enabled by Oxygen-Rich Gate Insulator Process. Extended Abstracts of the 2025 International Conference on Solid State Devices and Materials. 2025-09-16. https://doi.org/10.7567/ssdm.2025.n-2-01