REDM: Regression-Guided Diffusion Modeling for Universal Soft Sensor Enhancement in Semiconductor Process Control
Weiping Xie; Yumeng Shi; Pang Guo; Yining Chen
- Published
- Publisher
- IEEE
- Journal / collection
- 2026 31st Asia and South Pacific Design Automation Conference (ASP-DAC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/asp-dac66049.2026.11420290
The original publisher provides the full text and its access options.
Cite this source
Weiping Xie; Yumeng Shi; Pang Guo; Yining Chen. REDM: Regression-Guided Diffusion Modeling for Universal Soft Sensor Enhancement in Semiconductor Process Control. 2026 31st Asia and South Pacific Design Automation Conference (ASP-DAC). 2026-01-19. https://doi.org/10.1109/asp-dac66049.2026.11420290