Control of NOx emission using ozone oxidation combined with wet scrubbing method in semiconductor manufacturing
Ming-Chun Lu; Thi-Cuc Le; Hsueh-Hsing Lu; Chuen-Jinn Tsai
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Process Safety and Environmental Protection
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.psep.2025.107634
The original publisher provides the full text and its access options.
Cite this source
Ming-Chun Lu; Thi-Cuc Le; Hsueh-Hsing Lu; Chuen-Jinn Tsai. Control of NOx emission using ozone oxidation combined with wet scrubbing method in semiconductor manufacturing. Process Safety and Environmental Protection. 2025-09. https://doi.org/10.1016/j.psep.2025.107634