Development of UV-NIL resist for semiconductor device manufacturing
Akihiro Hakamata; Kazuyuki Usuki; Koichi Sato
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2025
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3049916
The original publisher provides the full text and its access options.
Cite this source
Akihiro Hakamata; Kazuyuki Usuki; Koichi Sato. Development of UV-NIL resist for semiconductor device manufacturing. Novel Patterning Technologies 2025. 2025-05-06. https://doi.org/10.1117/12.3049916