Machine learning and artificial intelligence in semiconductor metrology and inspection for smart manufacturing
Ye Lin Hu; Yu Chen Ge; Jiang Tao Dang; Hai Jun Gao; Gavin Jiang; Christine Chen
- Published
- Publisher
- SPIE
- Journal / collection
- Ninth International Workshop on Advanced Patterning Solutions (IWAPS 2025)
- Research area
- AI & compute
- Source type
- Conference paper
- DOI
- 10.1117/12.3093160
The original publisher provides the full text and its access options.
Cite this source
Ye Lin Hu; Yu Chen Ge; Jiang Tao Dang; Hai Jun Gao; Gavin Jiang; Christine Chen. Machine learning and artificial intelligence in semiconductor metrology and inspection for smart manufacturing. Ninth International Workshop on Advanced Patterning Solutions (IWAPS 2025). 2025-12-03. https://doi.org/10.1117/12.3093160