High-Performance Bi 2 O 2 Se Field Effect Transistor Fabrication Using Thermal Scanning Probe Lithography
Zeming Jin; Hongtao Li; Ziying Hu; Xia Liu; Yeliang Wang
- Published
- Publisher
- IEEE
- Journal / collection
- 2026 IEEE 21st International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/nems69704.2026.11633745
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Cite this source
Zeming Jin; Hongtao Li; Ziying Hu; Xia Liu; Yeliang Wang. High-Performance Bi 2 O 2 Se Field Effect Transistor Fabrication Using Thermal Scanning Probe Lithography. 2026 IEEE 21st International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). 2026-04. https://doi.org/10.1109/nems69704.2026.11633745