Spin coating in semiconductor lithography: Advances in modeling and future prospects
Pan Liu; Liejie Huang; Chaoyi Zheng; Yanan Bao; Dawei Gao; Guodong Zhou
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Microelectronic Engineering
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mee.2025.112326
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Cite this source
Pan Liu; Liejie Huang; Chaoyi Zheng; Yanan Bao; Dawei Gao; Guodong Zhou. Spin coating in semiconductor lithography: Advances in modeling and future prospects. Microelectronic Engineering. 2025-06. https://doi.org/10.1016/j.mee.2025.112326