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Research literature / Conference paper

Makespan Minimization of Photolithography Machines in Semiconductor Manufacturing

Liangchao Chen; Yan Qiao; Wensen Jiang; Siwei Zhang; NaiQi Wu; Simian Cai

Published
Publisher
IEEE
Journal / collection
2025 International Conference on Networking, Sensing and Control (ICNSC)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/icnsc66229.2025.00022

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Liangchao Chen; Yan Qiao; Wensen Jiang; Siwei Zhang; NaiQi Wu; Simian Cai. Makespan Minimization of Photolithography Machines in Semiconductor Manufacturing. 2025 International Conference on Networking, Sensing and Control (ICNSC). 2025-10-01. https://doi.org/10.1109/icnsc66229.2025.00022

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