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Research literature / Conference paper

Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges

Gerardo Bottiglieri; Pieter Woltgens; Reinier van der Meer; Sander Blok; Bram Slachter; John McNamara; Mark A. van de Kerkhof; Jan van Schoot; Michael Patra; Jens Timo Neumann; Heiko Feldmann

Published
Publisher
SPIE
Journal / collection
Optical and EUV Nanolithography XXXVIII
Research area
Semiconductors
Source type
Conference paper
DOI
10.1117/12.3050509

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Gerardo Bottiglieri; Pieter Woltgens; Reinier van der Meer; Sander Blok; Bram Slachter; John McNamara; Mark A. van de Kerkhof; Jan van Schoot; Michael Patra; Jens Timo Neumann; Heiko Feldmann. Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges. Optical and EUV Nanolithography XXXVIII. 2025-04-22. https://doi.org/10.1117/12.3050509

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