Comprehensive Modeling of Line Edge Roughness and Line Width Roughness in Semiconductor Nanofabrication
M. S. Kulpinov; V. V. Losev; A. Y. Krasyukov; V. V. Loseva; A. D. Kalyonov
- Published
- Publisher
- Pleiades Publishing Ltd
- Journal / collection
- Russian Microelectronics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1134/s1063739725602036
The original publisher provides the full text and its access options.
Cite this source
M. S. Kulpinov; V. V. Losev; A. Y. Krasyukov; V. V. Loseva; A. D. Kalyonov. Comprehensive Modeling of Line Edge Roughness and Line Width Roughness in Semiconductor Nanofabrication. Russian Microelectronics. 2025-12. https://doi.org/10.1134/s1063739725602036