Semiconductor epitaxial layer thickness calculation based on Drude–Lorentz hybrid model
Xinglong Zhang; Haoyuan Yang; Sinuo Li
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Optoelectronic Information and Communication Technology (OICT 2026)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3115822
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Cite this source
Xinglong Zhang; Haoyuan Yang; Sinuo Li. Semiconductor epitaxial layer thickness calculation based on Drude–Lorentz hybrid model. International Conference on Optoelectronic Information and Communication Technology (OICT 2026). 2026-05-23. https://doi.org/10.1117/12.3115822