Design, Investigation and Spacer optimization of a Tri metal- Stacked Gate Si-SiGe GAA cylindrical- Nanotube Field Effect Transistor (TM-SG-NTFET)
Abhishek Chauhan; Ashish Raman
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 International Conference on Electronics, AI and Computing (EAIC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/eaic66483.2025.11101492
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Cite this source
Abhishek Chauhan; Ashish Raman. Design, Investigation and Spacer optimization of a Tri metal- Stacked Gate Si-SiGe GAA cylindrical- Nanotube Field Effect Transistor (TM-SG-NTFET). 2025 International Conference on Electronics, AI and Computing (EAIC). 2025-06-05. https://doi.org/10.1109/eaic66483.2025.11101492